Specification:
1. for single wafer up to 100 mm (4") or 100 mm x 100 mm substrate size
2. easy changeable quartz glass process chamber with cover
3. with integrated gas in- and outlet
4. 1 Mass Flow Controller for Nitrogen (5 nlm = norm liter per minute) is default
5. heated by 18 Infrared lamps (20 kW)
6. top and bottom heating
7. vacuum for external pump system (up to 10exp-3 mbar, for up to 10exp-6 mbar: see RTP-100-HV))
8. SPS controller, SIMATIC
9. Ethernet interface
10. 7" Touch panel for easy programming and process control
11. max. temperature 1200 °C
12. temperature control by thermocouple
13. water cooling required
14. Electricity: CEE 3x32 A, 230 V, 3 Phase, +N, 20 Kw
15. Cooling: Water cooling required
16. Dimension: 503 x 525 x 570 mm (W x D x H)
17. Weight: 70 kg
ã€Brand： UNITEMP/GERMAN 】
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| Issue Time: |
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2024-05-14 |
| Expire Time: |
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2024-10-18 |
