ZnS target
Sputtering targets are produced for use in the sputtering of precious metals and magnetic materials, thereby increasing target utilization. Through engineering design, the enhanced profile provides utilization factors far in excess of those conventionally found in planar designed targets.
Specification:
Purity: 99.99%
Pervious range: 400-14,000 nm
Density: 4.09g/cm
3Refraction: 2.35/550 nm
Melting point: 1,700°C
Application: .Optical thin films .AR film.
Customization specification
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Issue Time: |
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2024-03-28 |
Expire Time: |
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2024-05-28 |